Evaluation of photosynthetic performance of wheat cultivars exposed to boron toxicity by the JIP fluorescence test

The changes in growth and photosynthetic performance of two wheat (Triticum aestivum L.) cultivars (Bolal-2973 and Atay-85) differing in their sensitivity to boron (B) toxicity were investigated under toxic B conditions. Eight-day old seedlings were exposed to highly toxic B concentrations (5, 7.5, and 10 mM H₃BO₃) for 5 and 9 days. Fast chlorophyll a fluorescence kinetics was determined and analysed using JIP test. Growth parameters, tissue B contents, and membrane damage were measured at two stress durations. The photochemical performance of PSII was hindered more in the sensitive cultivar (Atay-85) than that of the tolerant one (Bolal-2973) under B toxicity. The increase in the B concentration and stress duration caused membrane leakage in both cultivars. However, higher membrane damage was observed in Atay-85 compared to Bolal-2973. Additionally, significant reduction of growth parameters was observed in both cultivars at toxic B concentrations. The accumulation of B was higher in shoots than in roots of both cultivars. Nevertheless, Atay-85 translocated more B from roots to leaves compared to Bolal-2973. The advantages of certain JIP test parameters were demonstrated for evaluation of PSII activity in plants exposed to B stress. Evaluation of photosynthetic performance by JIP test as well as assessment of growth and tissue B content might be used to determine the effects of B toxicity in wheat. The results indicated lesser sensitivity to B toxicity in Bolal-2973 compared to Atay-85.